SPECS Trademark

Training for handling and operation of technical apparatus, in particular of surface analysis apparatus

Magnetic data carriers including software for control of surface analysis apparatus, lasers not for medical use, detectors, electron spectrometers, monochromators and their manuals; data processing equipment and computers; recorded computer programs including software for control of surface analysis apparatus, lasers not for medical use, detectors, electron spectrometers, monoebromators and their manuals; Sources for deposition of material, namely, Electron Cyclotron Resonance (ECR and Radio Frequency (RF) excited plasma cracker sources, single and multi pocket electron beam evaporators for deposition of thin metal and compound films, UHV compatible thermal gas cracker source, Reflection High Energy Electron Diffraction (RHEED electron gun; lasers not for medical use; surface analysis apparatus, namely, systems forfully automated qualitative and quantitative routine ESCA analysis, Ion and Secondary Neutral Mass Spectrometry SIMS/SNMS Systems, customized system consisting of the described components for surface science applications under UHV conditions; detectors,namely, Channel Electron Multipliers, Multichannel plate Detector, Delay line Detector,Spin Detector, all used for electron detection; electron spectrometers, monochromators,excitation sources for ion radiation, electron radiation, X-radiation and UV radiation,namely, extractor type ion sources for depth profiling, ISS and SIMS for reactive and non-reactive gases, electron flood gun for charge neutralization of positively charged insulators or semiconductors, electron sources for AES, scanning applications, EELS and electron pulse or desporption experiments, high intensity twin anode X-ray source for XPS experiments, ultraviolet source with high flux density and small spot size, for angular resolved studies; sample carriers, namely, carriers for holding and moving a sample which is sized in the mm2 range and consisting of a material which has to be examined under UHV conditions in a UHV chamber; microscopes; parts of the aforementioned goods

Design and development of computer hardware and software