SOITEC
LIVE

Serial Number

79204687

Owner

SOITEC

Attorney

Mari-Elise Paul

Filing Date

Nov 30, 2016

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SOITEC Trademark

Serial Number: 79204687 • Registration: 5563066

SOITEC is a trademark filed by SOITEC on November 30, 2016. The trademark is classified under Class 9 (Computers & Electronics), Class 40 (Treatment & Processing), Class 42 (Computer & Scientific). The application is currently registered and active.

Owner Contact Info

SOITEC (17 trademarks)

Parc Technologique des Fontaines -

Entity Type: 99

Trademark Details

Filing Date

November 30, 2016

Registration Date

September 18, 2018

Published for Opposition

July 3, 2018

Goods & Services

Scientific, technological, technical and industrial research in the field of material science for micro-electronics, opto-electronics, piezo electronics and micro-engineering, [ photovoltaics, ] microsystems and radio frequency (RF) components provided by engineers; testing of materials; laboratory work for others, namely, materials testing and scientific research and development; research and development of new products for others; scientific research and development in the field of wafers and semiconductors for opto-electronic and piezo electronics components, [ photovoltaics, ] radio frequency (RF) components, power components, micro-engineering, and micro-systems; scientific research and development in the field of silicon wafers and semiconductors for integrated circuits and derived activities; scientific research and development in the field of the transfer of micro-electronic circuits or micro-systems on all media; engineering and engineering services in the field of semiconductor wafers and semiconductors for micro-electronic, opto-electronic, piezo-electronic radio frequency (RF), micro-mechanical, [ photovoltaic components, ] memories, power components; engineering and engineering services in the field of silicon wafers and semiconductors for integrated circuits and derived activities and the transfer of micro-electronic or opto-electronic circuits or micro-systems on all types of media; research for the development of new products in the field of semiconductor wafers for the manufacture of electronic devices, for the manufacture of transistors, memories, diodes, photodiodes, [ light-emitting diodes, ] photodiode detectors, radio frequency (RF) components and micro-systems; assistance and technical support, namely, technical advice in the field of development of new products in the field of semiconductor wafers for the manufacture of electronic devices, for the manufacture of transistors, diodes, photodiodes, [ light-emitting diodes, ] photodiode detectors, radio frequency (RF) components and micro-systems

Treatment of materials by means of annealing, thermal annealing, rapid thermal annealing, laser annealing, oxidation, implantation for layer exfoliation, grinding, chemical and physical layer deposition in the nature of electrophoretic coating services, epitaxy, and bonding of material for layer transfer; Treatment of substrates by means of glass substrate polishing, grinding, chemical treatment of surface to remove particles and/or contaminants, laser irradiation, plasma treatment in the nature of applying plasma finishes, amorphization, re-crystallization, etching, chemical etching, plasma etching, carbonization, smoothing by means of plasma, heat treatment, plasma activation to hydrophilize surfaces, and hydrophilization for micro-electronics, opto-electronics, piezoelectric, [ photovoltaics, ] microsystems and radio frequency (RF) components; treatment of semiconductor wafers and semiconductors by means of laser beams, plasma in the nature of applying plasma finishes, annealing, and chemical treatment of surface to remove particles and/or contaminants; polishing of semiconductor wafers, transfer of layer by exfoliation; treatment of silicon wafers and semiconductors by means of laser beams, plasma in the nature of applying plasma finishes, annealing, and chemical treatment of surface to remove particles and/or contaminants; polishing of silicon wafers and semiconductors, transfer of layer by exfoliation

Semiconductor substrates for opto-electronics, micro-electronics, and micro-engineering, namely, semiconductor chips, integrated circuits, transistors, capacitors, filters for radiofrequency bandwidth selection, oscillators, electric switches, electric resistors, amplifiers, and electronic memories; semi-conductor wafers; semi-conductors; silicon wafers and semiconductors for integrated circuits and derived activities; semiconductor wafers for [ light-emitting diodes, ] radio frequency (RF) components and for power components; substrates for micro-electronics, opto-electronics, micro-engineering, [ light-emitting diodes, ] micro-systems, [ photovoltaics, ] integrated optical guides, sensors, integrated circuits, radio frequency (RF) and power components, namely, semiconductor chips, integrated circuits, transistors, capacitors, cable connectors, filters for radiofrequency bandwidth selection, oscillators, electric switches, electric resistors, amplifiers, and electronic memories

Filing History

PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
May 28, 2026 INPS
INVALIDATION PROCESSED
May 28, 2026 INPC
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Nov 6, 2025 INPR
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
Oct 10, 2025 NA75
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
Oct 10, 2025 C75A
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Oct 1, 2025 EROP
POST REGISTRATION ACTION MAILED - SEC. 71 & 15
Sep 12, 2025 PR75
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Aug 26, 2025 EROP
POST REGISTRATION ACTION MAILED - SEC. 71 & 15
Mar 6, 2025 PR75
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Feb 24, 2025 APRE
TEAS SECTION 71 & 15 RECEIVED
Sep 17, 2024 ES75
TEAS CHANGE OF CORRESPONDENCE RECEIVED
Jan 16, 2024 TCCA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Jan 16, 2024 ARAA
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Jan 16, 2024 REAP
COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
Sep 18, 2023 REM3
FINAL DECISION TRANSACTION PROCESSED BY IB
Jan 17, 2019 FINO
FINAL DISPOSITION NOTICE SENT TO IB
Dec 29, 2018 FICS
FINAL DISPOSITION PROCESSED
Dec 29, 2018 FIMP
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Dec 18, 2018 FICR
NEW REPRESENTATIVE AT IB RECEIVED
Dec 6, 2018 NREP
REGISTERED-PRINCIPAL REGISTER
Sep 18, 2018 R.PR
NOTIFICATION PROCESSED BY IB
Jul 6, 2018 GPNX
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Jul 3, 2018 NPUB
PUBLISHED FOR OPPOSITION
Jul 3, 2018 PUBO
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Jun 20, 2018 OPNS
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Jun 20, 2018 OP2R
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Jun 13, 2018 NONP
APPROVED FOR PUB - PRINCIPAL REGISTER
May 29, 2018 CNSA
TEAS/EMAIL CORRESPONDENCE ENTERED
May 21, 2018 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
May 21, 2018 CRFA
ASSIGNED TO LIE
May 18, 2018 ALIE
TEAS REQUEST FOR RECONSIDERATION RECEIVED
May 11, 2018 ERFR
EX PARTE APPEAL-INSTITUTED
May 11, 2018 EXPI
JURISDICTION RESTORED TO EXAMINING ATTORNEY
May 11, 2018 JURT
EXPARTE APPEAL RECEIVED AT TTAB
May 11, 2018 EXAF
ATTORNEY REVIEW COMPLETED
Feb 6, 2018 ATRV
CORRECTION FROM IB ENTERED - ATTORNEY REVIEW REQUIRED
Jan 24, 2018 CREV
CHANGE OF NAME/ADDRESS REC'D FROM IB
Dec 21, 2017 ADCH
CORRECTION TRANSACTION RECEIVED FROM IB
Dec 15, 2017 CRCV
NOTIFICATION OF FINAL REFUSAL EMAILED
Nov 13, 2017 GNFN
FINAL REFUSAL E-MAILED
Nov 13, 2017 GNFR
FINAL REFUSAL WRITTEN
Nov 13, 2017 CNFR
TEAS/EMAIL CORRESPONDENCE ENTERED
Oct 26, 2017 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Oct 25, 2017 CRFA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Oct 25, 2017 TROA
REFUSAL PROCESSED BY IB
May 13, 2017 RFNT
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Apr 26, 2017 RFCS
REFUSAL PROCESSED BY MPU
Apr 26, 2017 RFRR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Apr 25, 2017 RFCR
NON-FINAL ACTION WRITTEN
Apr 24, 2017 CNRT
APPLICATION FILING RECEIPT MAILED
Apr 14, 2017 MAFR
ASSIGNED TO EXAMINER
Apr 10, 2017 DOCK
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Apr 10, 2017 NWOS
SN ASSIGNED FOR SECT 66A APPL FROM IB
Apr 6, 2017 REPR