XTROLOGY Trademark

Semiconductor wafer inspection apparatus, namely, inspection machines for the physical inspection of semiconductor wafers; analyzing apparatus for defect of semiconductor wafers, namely, optical spectrum analyzers for analyzing defect of semiconductor wafers; analyzing apparatus for stress of semiconductor wafers, namely, optical spectrum analyzers for analyzing stress of semiconductor wafers; analyzing apparatus for composition of semiconductor wafers, namely, optical spectrum analyzers for analyzing composition of semiconductor wafers; semiconductor wafer measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor wafers; semiconductor wafer testing equipment; semiconductor photomask inspection apparatus, namely, inspection machines for the physical inspection of semiconductor photomask substrates; analyzing apparatus for defect of semiconductor photomasks, namely, optical spectrum analyzers for analyzing defect of semiconductor photomasks; analyzing apparatus for stress of semiconductor photomasks, namely, optical spectrum analyzers for analyzing stress of semiconductor photomasks; analyzing apparatus for composition of semiconductor photomasks, namely, optical spectrum analyzers for analyzing composition of semiconductor photomasks; semiconductor photomask measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor photomasks; semiconductor photomask testing equipment; semiconductor reticle inspection apparatus, namely, inspection machines for the physical inspection of semiconductor reticles; analyzing apparatus for defect of semiconductor reticles, namely, optical spectrum analyzers for analyzing defect of semiconductor reticles; analyzing apparatus for stress of semiconductor reticles, namely, optical spectrum analyzers for analyzing stress of semiconductor reticles; analyzing apparatus for composition of semiconductor reticles, namely, optical spectrum analyzers for analyzing composition of semiconductor reticles; semiconductor reticle measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor reticles; semiconductor reticle testing equipment; semiconductor substrate inspection, namely, inspection machines for the physical inspection of semiconductor substrates; analyzing apparatus for defect of semiconductor substrates; analyzing apparatus for stress of semiconductor substrates, namely, optical spectrum analyzers for analyzing stress of semiconductor substrates; analyzing apparatus for composition of semiconductor substrates namely, optical spectrum analyzers for analyzing composition of semiconductor substrates; semiconductor substrate measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor substrates; semiconductor substrate testing equipment; optical analyzers, namely, optical sensors for mapping semiconductor wafers; Raman spectrographic measurement apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition and shape using Raman spectrometers, not for medical purposes, and structural parts therefor; optical analyzers, namely, Raman spectroscopic analyzing apparatus, not for medical purposes, and structural parts therefor; measuring apparatus, namely, scientific instrumentation for measuring film thickness; measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements using spectral measurements; automated optical inspection apparatus, namely, inspection machines for the physical inspection of semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles; X-ray fluorescence measuring apparatus, namely, scientific instrumentation for measuring semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles using X-ray fluorescence; measuring or testing machines and instruments, namely, inspection machines for the physical inspection of semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles, and structural parts therefor; photoluminescence or fluorescence microscope spectrometers, not for medical purposes, and structural components therefor; optical machines and apparatus, namely, Raman spectrometers, not for medical purposes, photoluminescence spectrometers, not for medical purposes, ellipsometers, interferometric film thickness meters, X-ray fluorescence analyzers, and defect inspection instruments using laser scattering; optical machines and apparatus, namely, microscopes with viewing camera; cinematographic machines and apparatus; laboratory apparatus and instruments, namely, Raman spectrometers for laboratory use, photoluminescence spectrometers for laboratory use, ellipsometers, interferometric film thickness meters, X-ray fluorescence analyzers, and defect inspection instruments using laser scattering; downloadable and recorded computer software for the inspection, defect analysis, stress analysis, composition analysis, measurement and testing of semiconductor wafers, photomasks, reticles and substrates; scanning probe microscopes; X-ray fluorescence analyzing apparatus, namely, X-ray fluorescence analyzers; rotary converters; phase modifiers; batteries and dry cells; electric meters, magnetic electricity meters, and electrical outlet testers; electric wires and cables; spectacles and safety goggles; fire alarms; gas alarms