WONIK IPS
LIVE

Serial Number

79103531

Owner

WONIK CORPORATION

Filing Date

Mar 16, 2011

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WONIK IPS Trademark

Serial Number: 79103531 • Registration: 4204134

WONIK IPS is a trademark filed by WONIK CORPORATION on March 16, 2011. The trademark is classified under Class 7 (Machinery), Class 37 (Building & Construction). The application is currently registered and active.

Owner Contact Info

WONIK CORPORATION (3 trademarks)

20, PANGYO-RO 255BEON-GIL,
GYEONGGI-DO , KR

Entity Type: 99

WONIK IPS CO., LTD (23 trademarks)

75, Jinwisandan-ro, Jinwi-myeon
Pyeongtaek-si 17709 , KR

Entity Type: 03

Trademark Details

Filing Date

March 16, 2011

Registration Date

September 11, 2012

Published for Opposition

June 26, 2012

Goods & Services

Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, ] low temperature annealing apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, coupled sputtering apparatus, ] multiple sputtering apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * laser sublimation deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * organic molecular chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam generation apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam sputter deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, ion beam etching apparatus, ] ion beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam crystallization apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, electron beam annealing apparatus, ] oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [ ; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electrocutions display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; micro electromechanical systems (ME MS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix light emitting diode (GAMBOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]

Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor Keita apparatus, liquid Keita apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors [ ; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and GAMBOLED displays ]

Filing History

PARTIAL INVALIDATION PROCESSED BY THE IB
Dec 18, 2023 INNP
PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
Nov 16, 2023 INPS
INVALIDATION PROCESSED
Nov 16, 2023 INPC
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Nov 11, 2023 INPR
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
Mar 11, 2023 NA71
REGISTERED-SEC.71 ACCEPTED
Mar 11, 2023 71AG
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Mar 11, 2023 APRE
CHANGE OF OWNER RECEIVED FROM IB
Oct 7, 2022 CHLD
TEAS SECTION 71 RECEIVED
Sep 8, 2022 ES71
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
Sep 11, 2021 REM4
INTERNATIONAL REGISTRATION RENEWED
Apr 30, 2021 RNWL
INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE
Dec 17, 2019 INNA
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Nov 27, 2019 INPR
PARTIAL INVALIDATION PROCESSED BY THE IB
May 3, 2019 INNP
PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
Mar 27, 2019 INPS
INVALIDATION PROCESSED
Mar 27, 2019 INPC
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Feb 22, 2019 INPR
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
Jun 22, 2018 NA71
REGISTERED-SEC.71 ACCEPTED
Jun 22, 2018 71AG
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
May 11, 2018 APRE
TEAS SECTION 71 RECEIVED
Apr 30, 2018 ES71
LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Nov 16, 2017 LIMN
CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Oct 23, 2017 CORN
CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Oct 23, 2017 CORN
CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Oct 16, 2017 CORN
CORRECTION TRANSACTION RECEIVED FROM IB
Oct 13, 2017 CRCV
CORRECTION TRANSACTION RECEIVED FROM IB
Oct 13, 2017 CRCV
CORRECTION TRANSACTION RECEIVED FROM IB
Oct 13, 2017 CRCV
LIMITATION OF GOODS RECEIVED FROM IB
Oct 13, 2017 LIMG
COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
Sep 11, 2017 REM3
CHANGE OF OWNER RECEIVED FROM IB
Jul 21, 2016 CHLD
INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE
Jul 5, 2016 INNA
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Jul 5, 2016 INPR
LIMITATION FROM THE IB EXAMINED AND ENTERED
Nov 6, 2015 LIME
CORRECTION UNDER SECTION 7 - PROCESSED
Nov 5, 2015 COC.
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Nov 5, 2015 APRE
LIMITATION OF GOODS RECEIVED FROM IB
Jul 31, 2015 LIMG
FINAL DECISION TRANSACTION PROCESSED BY IB
Jan 7, 2013 FINO
FINAL DISPOSITION NOTICE SENT TO IB
Dec 17, 2012 FICS
FINAL DISPOSITION PROCESSED
Dec 17, 2012 FIMP
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Dec 11, 2012 FICR
NOTIFICATION PROCESSED BY IB
Dec 10, 2012 GPNX
REGISTERED-PRINCIPAL REGISTER
Sep 11, 2012 R.PR
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Jun 26, 2012 NPUB
PUBLISHED FOR OPPOSITION
Jun 26, 2012 PUBO
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Jun 6, 2012 OPNS
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Jun 6, 2012 OP2R
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Jun 6, 2012 NONP
LAW OFFICE PUBLICATION REVIEW COMPLETED
May 21, 2012 PREV
APPROVED FOR PUB - PRINCIPAL REGISTER
May 14, 2012 CNSA
TEAS/EMAIL CORRESPONDENCE ENTERED
Apr 19, 2012 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Apr 19, 2012 CRFA
ASSIGNED TO LIE
Apr 13, 2012 ALIE
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Apr 3, 2012 TROA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
Apr 3, 2012 TCCA
CHANGE OF NAME/ADDRESS REC'D FROM IB
Dec 30, 2011 ADCH
REFUSAL PROCESSED BY IB
Dec 19, 2011 RFNT
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Nov 15, 2011 RFCS
REFUSAL PROCESSED BY MPU
Nov 15, 2011 RFRR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Nov 15, 2011 RFCR
NON-FINAL ACTION WRITTEN
Nov 14, 2011 CNRT
FAX RECEIVED
Nov 14, 2011 FAXX
NON-FINAL ACTION (IB REFUSAL) WITHDRAWN FOR REVIEW
Nov 8, 2011 RFWR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Nov 5, 2011 RFCR
NON-FINAL ACTION WRITTEN
Nov 4, 2011 CNRT
APPLICATION FILING RECEIPT MAILED
Nov 1, 2011 MAFR
ASSIGNED TO EXAMINER
Oct 28, 2011 DOCK
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Oct 28, 2011 NWOS
SN ASSIGNED FOR SECT 66A APPL FROM IB
Oct 27, 2011 REPR