WONIK IPS
LIVE

Serial Number

79102249

Owner

WONIK IPS CO., LTD

Filing Date

Mar 16, 2011

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WONIK IPS Trademark

Serial Number: 79102249 • Registration: 4204098

WONIK IPS is a trademark filed by WONIK IPS CO., LTD on March 16, 2011. The trademark is classified under Class 7 (Machinery), Class 37 (Building & Construction). The application is currently registered and active.

Owner Contact Info

WONIK IPS CO., LTD (21 trademarks)

75, Jinwisandan-ro, Jinwi-myeon
Pyeongtaek-si 17709 , KR

Entity Type: 03

Trademark Details

Filing Date

March 16, 2011

Registration Date

September 11, 2012

Published for Opposition

June 26, 2012

Cancellation Date

March 17, 2021

Goods & Services

Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]

Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ]

Filing History

NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED
Oct 3, 2021 DENC
DEATH OF INTERNATIONAL REGISTRATION
Oct 3, 2021 DETH
TOTAL INVALIDATION PROCESSED BY THE IB
Jul 3, 2020 INNT
TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
Jun 4, 2020 INTS
INVALIDATION PROCESSED
Jun 4, 2020 INPC
TOTAL INVALIDATION OF REG EXT PROTECTION CREATED
Apr 18, 2020 INTR
NOTICE OF CANCELLATION SEC. 71 E-MAILED
Aug 20, 2019 NC71
CANCELLED SECTION 71
Aug 18, 2019 C71T
INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE
Apr 16, 2019 INNA
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Mar 31, 2019 INPR
POST REGISTRATION ACTION MAILED - SEC.71
Feb 11, 2019 PR71
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Feb 7, 2019 APRE
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Jan 31, 2019 EROP
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Jan 31, 2019 EROP
POST REGISTRATION ACTION MAILED - SEC.71
Jul 31, 2018 PR71
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
May 8, 2018 APRE
TEAS SECTION 71 RECEIVED
Apr 27, 2018 ES71
CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Oct 16, 2017 CORN
CORRECTION TRANSACTION RECEIVED FROM IB
Oct 13, 2017 CRCV
COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
Sep 11, 2017 REM3
CHANGE OF OWNER RECEIVED FROM IB
Jul 21, 2016 CHLD
LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Aug 17, 2015 LIMN
LIMITATION OF GOODS RECEIVED FROM IB
Jul 31, 2015 LIMG
FINAL DECISION TRANSACTION PROCESSED BY IB
May 6, 2013 FINO
FINAL DISPOSITION NOTICE SENT TO IB
Apr 16, 2013 FICS
FINAL DISPOSITION PROCESSED
Apr 16, 2013 FIMP
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Dec 11, 2012 FICR
NOTIFICATION PROCESSED BY IB
Dec 2, 2012 GPNX
REGISTERED-PRINCIPAL REGISTER
Sep 11, 2012 R.PR
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Jun 26, 2012 NPUB
PUBLISHED FOR OPPOSITION
Jun 26, 2012 PUBO
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Jun 6, 2012 OPNS
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Jun 6, 2012 OP2R
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Jun 6, 2012 NONP
LAW OFFICE PUBLICATION REVIEW COMPLETED
May 21, 2012 PREV
APPROVED FOR PUB - PRINCIPAL REGISTER
May 11, 2012 CNSA
EXAMINER'S AMENDMENT ENTERED
May 11, 2012 XAEC
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
May 11, 2012 GNEN
EXAMINERS AMENDMENT E-MAILED
May 11, 2012 GNEA
EXAMINERS AMENDMENT -WRITTEN
May 11, 2012 CNEA
TEAS/EMAIL CORRESPONDENCE ENTERED
Apr 19, 2012 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Apr 19, 2012 CRFA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
Apr 6, 2012 TCCA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Apr 6, 2012 TROA
CHANGE OF NAME/ADDRESS REC'D FROM IB
Dec 30, 2011 ADCH
REFUSAL PROCESSED BY IB
Oct 30, 2011 RFNT
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Oct 19, 2011 CHAN
ASSIGNED TO LIE
Oct 13, 2011 ALIE
FAX RECEIVED
Oct 12, 2011 FAXX
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Oct 11, 2011 RFCS
REFUSAL PROCESSED BY MPU
Oct 11, 2011 RFRR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Oct 10, 2011 RFCR
NON-FINAL ACTION WRITTEN
Oct 9, 2011 CNRT
APPLICATION FILING RECEIPT MAILED
Oct 4, 2011 MAFR
ASSIGNED TO EXAMINER
Sep 30, 2011 DOCK
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Sep 30, 2011 NWOS
SN ASSIGNED FOR SECT 66A APPL FROM IB
Sep 29, 2011 REPR