VEM
LIVE

Serial Number

77788023

Owner

Vacuum Engineering & Materials Co., Inc.

Attorney

Grace Han Stanton

First Use Date

Feb 29, 1988

Filing Date

Jul 23, 2009

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VEM Trademark

Serial Number: 77788023 • Registration: 3960351

VEM is a trademark filed by Vacuum Engineering & Materials Co., Inc. on July 23, 2009. The trademark is classified under Class 1 (Chemicals), Class 6 (Metal Goods). The application is currently registered and active.

Owner Contact Info

Vacuum Engineering & Materials Co., Inc. (2 trademarks)

Santa Clara, CA 95050

Entity Type: 03

Trademark Details

Filing Date

July 23, 2009

Registration Date

May 17, 2011

First Use Anywhere

February 29, 1988

First Use in Commerce

February 29, 1988

Published for Opposition

March 1, 2011

Goods & Services

Titanium aluminum, tungsten titanium, aluminum silicon, aluminum silicon copper, aluminum copper, gold tin, gold germanium, gold nickel, iron hafnium, iron zirconium, cobalt iron tantalum, nickel chromium silicon, and tungsten silicon alloys, cermets, and refractory compounds, namely, refractory blocks of metal, refractory shapes of metal, fired refractory materials of metal in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of metal bonded with titanium aluminum, tungsten titanium, aluminum silicon, aluminum silicon copper, aluminum copper, gold tin, gold germanium, gold nickel, iron hafnium, iron zirconium, cobalt iron tantalum, nickel chromium silicon, and tungsten silicon alloys, cermets, and refractory compounds, namely, refractory blocks of metal, refractory shapes of metal, fired refractory materials of metal used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; Precious and semi-precious metals in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of precious and semi-precious metals bonded with precious and semi-precious metals used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics

Oxides and carbides in pellets, granules, tablets, flakes, powder, rod, wire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics; discs and sputtering targets made primarily of oxides and carbides bonded with oxides and carbides used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductor, compound semiconductor, wireless radio frequency and microwave, precision optics/laser, photovoltaic/solar, emerging display technologies, data storage, micro-electro-mechanical systems, automotive, aerospace/defense, and ophthalmics

Filing History

NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
Sep 13, 2021 NA89
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
Sep 13, 2021 RNL1
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
Sep 13, 2021 89AG
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Sep 13, 2021 APRE
TEAS SECTION 8 & 9 RECEIVED
May 12, 2021 E89R
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
May 17, 2020 REM2
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
Dec 13, 2017 NA85
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
Dec 13, 2017 C15A
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Dec 13, 2017 APRE
TEAS SECTION 8 & 15 RECEIVED
Nov 17, 2017 E815
REGISTERED-PRINCIPAL REGISTER
May 17, 2011 R.PR
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Mar 1, 2011 NPUB
PUBLISHED FOR OPPOSITION
Mar 1, 2011 PUBO
LAW OFFICE PUBLICATION REVIEW COMPLETED
Jan 26, 2011 PREV
APPROVED FOR PUB - PRINCIPAL REGISTER
Jan 24, 2011 CNSA
EXAMINER'S AMENDMENT ENTERED
Jan 24, 2011 XAEC
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
Jan 24, 2011 GNEN
EXAMINERS AMENDMENT E-MAILED
Jan 24, 2011 GNEA
EXAMINERS AMENDMENT -WRITTEN
Jan 24, 2011 CNEA
PREVIOUS ALLOWANCE COUNT WITHDRAWN
Jan 24, 2011 ZZZX
WITHDRAWN FROM PUB - OG REVIEW QUERY
Jan 21, 2011 PBCR
LAW OFFICE PUBLICATION REVIEW COMPLETED
Jan 13, 2011 PREV
ASSIGNED TO LIE
Jan 12, 2011 ALIE
APPROVED FOR PUB - PRINCIPAL REGISTER
Dec 16, 2010 CNSA
TEAS/EMAIL CORRESPONDENCE ENTERED
Nov 24, 2010 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Nov 24, 2010 CRFA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Nov 24, 2010 TROA
NOTIFICATION OF NON-FINAL ACTION E-MAILED
May 24, 2010 GNRN
NON-FINAL ACTION E-MAILED
May 24, 2010 GNRT
NON-FINAL ACTION WRITTEN
May 24, 2010 CNRT
NOTIFICATION OF NON-FINAL ACTION E-MAILED
May 21, 2010 GNRN
NON-FINAL ACTION E-MAILED
May 21, 2010 GNRT
NON-FINAL ACTION WRITTEN
May 21, 2010 CNRT
TEAS/EMAIL CORRESPONDENCE ENTERED
May 1, 2010 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Apr 30, 2010 CRFA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Apr 30, 2010 TROA
ASSIGNED TO EXAMINER
Jan 6, 2010 DOCK
NOTIFICATION OF NON-FINAL ACTION E-MAILED
Oct 30, 2009 GNRN
NON-FINAL ACTION E-MAILED
Oct 30, 2009 GNRT
NON-FINAL ACTION WRITTEN
Oct 30, 2009 CNRT
ASSIGNED TO EXAMINER
Oct 26, 2009 DOCK
NOTICE OF PSEUDO MARK MAILED
Jul 28, 2009 MPMK
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Jul 27, 2009 NWOS
NEW APPLICATION ENTERED
Jul 27, 2009 NWAP