Serial #78691739
LIVE

Serial Number

78691739

Owner

MATHESON TRI-GAS, INC.

Attorney

Deepak Nambiar

First Use Date

Sep 30, 2004

Filing Date

Aug 12, 2005

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Serial #78691739 Trademark

Serial Number: 78691739 • Registration: 3341293

Serial #78691739 is a trademark filed by MATHESON TRI-GAS, INC. on August 12, 2005. The trademark is classified under Class 1 (Chemicals), Class 4 (Lubricants & Fuels), Class 5 (Pharmaceuticals), Class 9 (Computers & Electronics), Class 11 (Environmental Control). The application is currently registered and active.

Owner Contact Info

MATHESON TRI-GAS, INC. (53 trademarks)

150 Allen Road
Basking Ridge, NJ 07920

Entity Type: 03

Trademark Details

Filing Date

August 12, 2005

Registration Date

November 20, 2007

First Use Anywhere

September 30, 2004

First Use in Commerce

October 31, 2004

Published for Opposition

June 27, 2006

Goods & Services

Instruments, namely, [ gas chromatographs, process analyzers, laboratory analyzers, ] gas detectors, safety analyzers, [ spectyophotometers, spectrometers, ] detection systems primarily comprised of gas detectors, gas monitors, gas calibration kits comprised of pressure regulators and flowmeters for field calibration of gas detection systems or portable instrumentation, [ and gas analyzers, ] regulators and gauges, and controls and parts thereof for the controlled dispensing and measuring of gases in laboratory and industrial use; flow and [ level ] instrumentation, namely, flow meters, mass flow transducers, blenders, gas standards generators, flow-totalizers, rotameters, and control valves for measuring and controlling the flow of gases and for the monitoring and control of gases; apparatus for the handling, measuring, and controlled dispensing of compressed gases from cylinders, namely, control valves, pressure regulators for regulating the handling, measuring, and controlled dispensing of compresses gases and cryogenic liquids, flow meters, and gauges; equipment for gas containment and distribution, namely, gas panels, gas cabinets, gas manifolds, switchover systems primarily comprised of more than one gas source, two regulators and a common discharge line, point-of-use distribution panels, pressure regulators, flow valves, monitors, pressure transducers, and pressure monitors; gas detectors and monitors; [ gas hygrometers; ] welders, in the nature of electric stick metal arc, tungsten inert gas, metal inert gas, plasma, and submerged arc welders, welding electrodes and wire [ therefor ] ; protective masks, namely, welding masks, gas masks, and dust masks; protective gloves; and mass flow meters for flow sensing of gases

Gases for medical use

Gases used as fuels

Gases for general industrial use, namely, 1,1,1,2-tetrafluoroethane; 1,1,1-trichioro-2,2,2-trifluoroethane; 1,1,1-trichloroethane; 1,1,2,2-tetrachloroethane; 1,1,2-trichloro-1,2,2-trifluoroethane; 1,1,2-trichloroethane; 1,1-dichloroethylene; 1,1-difluoroethane; 1,2-dichiorotetrafluoroethane; 1,3 butadiene; 1-butene; 1-chloro-2-propanol; 1-chloropropane; 1-hexene; 1-octene; 1-pentene; 2,2,4-trimethylpentane; 2,3-dimethylbutane; 2,4-dimethylpentane; 2,5-dimethyithiophene; 2-ethylbutene-1; 2-hexene; 2-methyl butraldehyde; 2-methyl-1-butene; 2-methyl-2-butene; 2-methylbutane; 2-methyihexane; 2-methylpentane; 2-methyithiophene; 2-pentene; 2-propanol; 3,3-dimethyl-1-butene; 3-methyl-1-butene; 3-methylpentane; 4-methyl-1-pentene; 4-vinylcyclohexene; carbon monoxide; carbon dioxide and nitrogen; ethanol in air; acetaldehyde; acetone; acetonitrile; acetylacetone; acetylene; acrolein; [ acrylonitrile; ] acrylonitrile; compressed air; allene; ammonia; antimony pentafluoride; argon; argon and carbon dioxide mixture; argon and helium mixture; argon and oxygen mixture; arsenic fluoride; arsenic pentafluoride; arsine; benzene; benzoic acid; benzyl-D7 chionde; [ bis, 2-methoxyethyl adipate; ] boron trichloride; boron trifluoride; bromine pentafluoride; bromine trifluoride; bromochiorodifluoromethane; bromotrifluoroethylene; butadiene; butyl benzene; butyl mercaptan; butyl nitrate; calibration gas; carbon dioxide; carbon dioxide in argon and helium mixture; carbon disulfide; carbon monoxide; carbon monoxide in air; carbon monoxide in nitrogen; carbontetrachloride; carbonyl fluoride; carbonyl sulfide; [ alpha-hydro-omega-hydroxy-poly (oxy-1,2-ethanediyl); ] chlorine; chlorine trifluoride; multi component mixture containing volatile organics in trace quantities with balance gas nitrogen; chlorobenzene; chlorodifluoromethane; chloroform; chloroiodomethane; chloropentafluoroethane; chlorotrifluoromethane; cinnamaldehyde; cis-1,2-dichloroethylene; cis-2-butene; cis-2-pentene; cumene; cyanogen; cyanogen chloride; cyclohexane; cyclohexanone; cyclopentane; cyclopropane; deuterium; diborane; dibromomethane; dibutyl ether; dichlorodifluoromethane; dichloromethane; dichloromonofluoromethane; dichiorosilane; dichlorotetrafluoroethane; diethyl disufide; diethyl telluride; difluorodibromomethane; difluoromonochloroethane; digermane; dimethyl ether; dimethyl sulfate; dimethyl sulfide; dimethyl sulfoxide; dimethylamine; dimethyl zinc; dipropyl ether; disilane; dodecane; 2-chloro-1-difluoromethoxy-1,1,2-trifluoroethane; ethane; ethanol; ethyl acetate; ethyl acetylene; ethyl acrylate; ethyl alcohol; ethyl benzene; ethyl chloride; ethyl cyclohexane; ethyl ether; ethyl formate; ethyl mercaptan; ethyl methyl sulfide; ethyl sulfide; ethylamine; ethylene; ethylene dichloride; ethylene glycol; ethylene glycol dimethyl ether; ethylene glycol monomethyl ether; ethylene oxide and nitrogen; ethyleneoxide; fluorine; trifluoromethane; fluorotrichloromethane; 2-chloro-2-difluoromethoxy-1,1,1-trifluoroethane; formaldehyde gas; furan; furfuryl alcohol; germanium tetrachloride; germanium tetrahydride; trichlorofluoromethane; chlorotrifluoroethylene; trichlorotrifluoroethane; 1,2-dichloro-1,1,2,2-tetrafluoroethane; hexafluoroethane; dichlorodifluoromethane; chlorotrifluoromethane; 1,1,1,2-tetrafluoroethane; bromotrifluoromethane; carbon tetrafluoride; monochlorodifluoromethane; trifluoromethane; octafluorocyclobutane; 1,1,1-trifluoro-2-chloro-2-bromoethane; helium; heptane; hexafluoroethane; hexafluoropropene; [ hexafluorpropylene; ] hydriodic acid; hydrogen; hydrogen bromide; hydrogen chloride; hydrogen cyanide; hydrogen fluoride; hydrogen selenide; hydrogen sulfide; hydrogen iodide; iodine pentafluoride; isobutane; isobutene; isobutyl alcohol; isobutyl nitrate; isobutylene; isohexene; isopentane; isoprene; isopropyl alcohol; isopropyl chloride; isopropyl ether; isopropyl mercaptan; krypton; methane; methane in argon, helium and nitrogen or air mixture; methane; methane and hydrogen gas mixture; methanol; methoxyflurane; methyl acetate; methyl acetylene; methyl acrylate; methyl alcohol; methyl bromide; methyl chloride; methyl chloroform; methyl disulfide; methyl ethyl ketone; methyl fluoride; methyl formate; methyl iodide; methyl isobutyl ketone; methyl mercaptan; methyl methacrylate; methyl propionate; methyl salicylate; methyl tert-butyl ether; methyl vinyl ketone; dimethoxymethane; methylamine; methylcyclopentane; methylene bromide; methylene fluoride; monomethylamine; m-xylene; n-amylamine; [ metal oxides ]and metal chlorides; metal oxides, [ metal bromides absorbed hydrogen bromide on compound, ] and hydrogen bromide vapor; metal oxides, metal chlorides, [ absorbed hydrogen chloride on compound, ] and hydrogen chloride vapor; organolithium polymer, lithium amide, and anhydrous ammonia; organolithium, sulfur hexafluoride, and lithium hydride; organolithium polymer and lithium hydride; [ metal oxides; ] naphthalene; n-butane; n-butyl acetate; n-butyl alcohol; n-butyl sulfide; n-butyraldehyde; n-decane; neohexane; neon; neopentane; n-heptane; n-hexane; nickel carbonyl; nitric oxide; nitric oxide and nitrogen mixture; nitric oxide and sulfur dioxide and nitrogen gas mixture; nitrogen dioxide; nitrogen trifluoride; nitrosyl chloride; nitrous oxide; n-octane; nonane; n-pentane; n-propyl acetate; n-propyl alcohol; octafluorocyclobutane; octafluorocyclopentene; octane; o-dichlorobenzene; oxides of nitrogen in nitrogen; oxygen in nitrogen; oxygen, compressed gas; oxygen and nitrogen gas mixture; o-xylene; pentane; perfluoro-2-butene; perfluoropropane; permanganate and alkali impregnated diatomaceous earth; phosgene; phosphine; phosphine pentafluoride; phosphorus pentafluoride; phosphorus trifluoride, piperidine; tetraethylene glycol dimethyl ether and sodium naphthalene complex; ethylene glycol dimethyl ether and sodium naphthalene complex; propane; propane in air; propane in nitrogen; propionaldehyde; propyl mercaptan; propylene; propylene oxide; p-xylene; pyridine; arsenic fluoride; arsine; boron trifluoride; germanium tetrafluoride; phosphine; silicon tetrafluoride; sec-butyl alcohol; silane; silicon tetrachloride; silicon tetrafluoride; sodium dichromate; [ sodium dispersion in mineral spirits; sodium dispersion in naphthalene; sodium dispersion in transformer oil; sodium metal dispersion in organic solvent; sodium metal; sodium methylate; sodium shot; ] styrene; styrene monomer; sulfur dioxide; sulfur dioxide in air; sulfur dioxide in nitrogen; [ sulfur dioxide and nitrogen mixture; ] sulfur hexafluoride; sulfur tetrafluoride; sulfuryl fluoride; tert-butyl chloride; tert-butyl mercaptan; tetrachloroethylene; tetraethylene glycol dimethyl ether; tetraethylorthosilicate; tetrafluoroethylene; tetrafluoromethane; tetrahydrofuran; tetrahydronaplithalene; thiophene; titanium tetrachloride; toluene; trans-1,2-dichloroethylene; trans-2-butene; trans-2-pentene; trans-3-hexene; trans-3-hexene; transition metal salt impregnated diatomaceous earth; trichioroethylene; trichlorsilane; triethyl phosphite; triethylene glycol; trifluorochloroethylene; trifluoromonobromomethane; trimethyl phosphite; trimethylamine; tungsten hexafluoride; undecane; valeraldehyde; vinyl acetate; vinyl bromide; vinyl chloride; vinyl fluoride; vinyl methyl ether; vinylidene chloride; vinylidene fluoride; xenon; zinc arsenide; enriched stable isotopes; stable isotope labeled compounds; and liquefied gases, namely, argon, carbon dioxide, nitrogen oxide, oxygen, and o-dichlorobenzene

Apparatus for the handling, measuring, and controlled dispensing of compressed gases in cylinders, namely, separators for filtering and purifying compressed gases [, gas scrubbers, oxygen generators ]

Filing History

NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
Jun 30, 2017 NA89
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
Jun 30, 2017 RNL1
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
Jun 30, 2017 89AG
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Jun 30, 2017 APRE
TEAS SECTION 8 & 9 RECEIVED
May 22, 2017 E89R
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
Nov 20, 2016 REM2
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
Jul 23, 2013 NA85
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
Jul 23, 2013 C15A
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Jul 22, 2013 APRE
TEAS SECTION 8 & 15 RECEIVED
Jul 9, 2013 E815
REGISTERED-PRINCIPAL REGISTER
Nov 20, 2007 R.PR
LAW OFFICE REGISTRATION REVIEW COMPLETED
Oct 18, 2007 REGV
ASSIGNED TO LIE
Oct 17, 2007 ALIE
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
Sep 18, 2007 CNPR
DATA MODIFICATION COMPLETED
Sep 13, 2007 DMCC
TEAS/EMAIL CORRESPONDENCE ENTERED
Sep 8, 2007 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
Aug 22, 2007 CRFA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
Aug 22, 2007 TROA
NON-FINAL ACTION MAILED
Jun 27, 2007 CNRT
SU - NON-FINAL ACTION - WRITTEN
Jun 26, 2007 CNRT
STATEMENT OF USE PROCESSING COMPLETE
Jun 22, 2007 SUPC
USE AMENDMENT FILED
Mar 15, 2007 IUAF
TEAS STATEMENT OF USE RECEIVED
Mar 15, 2007 EISU
NOA MAILED - SOU REQUIRED FROM APPLICANT
Sep 19, 2006 NOAM
PUBLISHED FOR OPPOSITION
Jun 27, 2006 PUBO
NOTICE OF PUBLICATION
Jun 7, 2006 NPUB
LAW OFFICE PUBLICATION REVIEW COMPLETED
Mar 27, 2006 PREV
ASSIGNED TO LIE
Mar 24, 2006 ALIE
APPROVED FOR PUB - PRINCIPAL REGISTER
Mar 17, 2006 CNSA
AMENDMENT FROM APPLICANT ENTERED
Mar 16, 2006 ACEC
CORRESPONDENCE RECEIVED IN LAW OFFICE
Mar 2, 2006 CRFA
PAPER RECEIVED
Mar 2, 2006 MAIL
LETTER OF SUSPENSION MAILED
Sep 15, 2005 CNSL
SUSPENSION LETTER WRITTEN
Sep 15, 2005 CNSL
EXAMINERS AMENDMENT -WRITTEN
Sep 15, 2005 CNEA
ASSIGNED TO EXAMINER
Sep 8, 2005 DOCK
NEW APPLICATION ENTERED
Aug 19, 2005 NWAP