Serial Number
98182001
Owner
ASM IP Holding B.V.Attorney
Heather Smith-CarraFirst Use Date
Apr 19, 2024
Filing Date
Sep 15, 2023
TESSION Trademark
Serial Number: 98182001
Trademark Classes
Owner Contact Info
Legal Representation
Correspondence Address
Heather Smith-Carra BANNER WITCOFF, LTD.
1100 13TH STREET, NW
SUITE 1200
WASHINGTON, DC 20005
United States
Trademark Details
Filing Date
September 15, 2023
Registration Date
Not Registered
First Use Anywhere
April 19, 2024
First Use in Commerce
April 19, 2024
Published for Opposition
July 2, 2024
Goods & Services
Electrical reactors for processing semiconductor wafers; electronic controllers for electrical reactors and industrial robots for use by the semiconductor industry; electronic control systems for semiconductor manufacturing machines; laboratory chemical reactors; robots being electronic control devices, namely, laboratory robots; electronic control systems for machines; structural parts for laboratory chemical reactors, electrical reactors for processing semiconductor wafers and laboratory robots
Machines for the assembly and packaging of electronic semiconductor chips; machines for manufacturing semiconductors, and structural parts therefor; semiconductor manufacturing machines; semiconductor manufacturing machines and systems composed of a vacuum chamber for accommodating semiconductor wafers and structural parts therefor and machines for handling and transferring semiconductor wafers into and out of the vacuum chamber, and structural parts therefor; machines for the treatment of semiconductor wafers, namely, semi-conductor wafer processing machines; industrial robots for the handling of semiconductor wafers; machines for the assembly and packaging of electronic chips; industrial chemical reactors; industrial robots; machines for the plasma assisted manufacture of semiconductor devices, namely, vacuum treatment machines for plasma assisted deposition, and vacuum machines for depositing fine films; plasma enhanced deposition machines, namely, semiconductor manufacturing machines utilizing plasma-enhanced deposition, and structural parts therefor; reactors for processing semiconductor wafers, namely, industrial chemical reactors for the thermal treatment of semiconductor wafers and industrial chemical reactors for chemical vapor deposition; semiconductor wafer processing equipment, namely, plasma-enhanced deposition reactors; semiconductor manufacturing machines, namely, electronically-operated machines for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by plasma-enhanced deposition