NANOOCS Trademark
Serial Number: 76391052
Trademark Classes
Owner Contact Info
Trademark Details
Filing Date
April 2, 2002
Registration Date
Not Registered
Published for Opposition
November 19, 2002
Goods & Services
Overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference may be corrected on future exposures