FIAMMETTA
LIVE

Serial Number

79433213

Owner

Xtal.works Sweden AB

Attorney

Maurine Knutsson

Filing Date

Aug 14, 2025

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FIAMMETTA Trademark

Serial Number: 79433213

FIAMMETTA is a trademark filed by Xtal.works Sweden AB on August 14, 2025. The trademark is classified under Class 9 (Computers & Electronics). The application is currently pending registration.

Owner Contact Info

Xtal.works Sweden AB (3 trademarks)

c/o ProNano/Rise,

Entity Type: 98

Trademark Details

Filing Date

August 14, 2025

Registration Date

Not Registered

Goods & Services

Scientific research and laboratory apparatus, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems, and wafer manufacturing equipment; educational apparatus and simulators, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems, and wafer manufacturing equipment; measuring, detecting, monitoring and controlling devices, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; testing and quality control devices, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; scientific, research, surveying, optical, weighing, measuring, signaling, detecting, testing, inspecting, and teaching apparatus and instruments, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems, wafer manufacturing equipment, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; semiconductor devices; integrated circuits, semiconductor chips, and wafers; semiconductors; semiconductor testing apparatus; electronic components in the nature of electric contactors; transistors, diodes, and electric resistors; downloadable computer software for use in processing semiconductor wafers; recorded computer software for use in processing semiconductor wafers; downloadable computer software for the testing, analysis, production, manufacture, operation, and optimization of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, and silicon wafers; recorded computer software for the testing, analysis, production, manufacture, operation, and optimization of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, and silicon wafers; downloadable computer software for photolithography, microlithography, and electronic design automation (EDA); recorded computer software for photolithography, microlithography, and electronic design automation (EDA); downloadable software for designing and simulating semiconductor devices; recorded software for designing and simulating semiconductor devices; downloadable software used for simulating and optimizing the crystal growth process; recorded software used for simulating and optimizing the crystal growth process; downloadable software for monitoring, analysing, controlling and running physical world operations of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, silicon wafers, photolithography, microlithography, and electronic design automation (EDA); recorded software for monitoring, analysing, controlling and running physical world operations of semiconductors, microelectronics, nanotechnology, semiconductor discs and circuits, crystal growth for semiconductors, SiC crystals, silicon carbide crystals, printed circuit boards, substrates, computer chips, electrical and electronic components, integrated circuits and transistors, silicon wafers, photolithography, microlithography, and electronic design automation (EDA); scientific instruments, namely, high-temperature chemical vapor deposition (HTCVD) device, physical vapor transport (PVT) devices, crystal growing furnaces, pullers, and reactors, melt growth systems, wafer manufacturing equipment, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers; apparatus, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers for testing and measuring semiconductor materials; apparatus, namely, x-ray diffractometers, infrared cameras, furnace load cells, optical defect inspection systems, atomic force microscopes, scanning electron microscopes, capacitive gauges, optical gauges, four-point probe meters, electron beam inspection devices, ellipsometers, profilometers, particle counters, chemical purity analyzers, scanning electron microscopes, and system-on-chip (SoC) testers for testing and measuring the quality and properties of the grown SiC crystals; electrical test apparatus, namely, electronic apparatus for testing the electrical conductivity of semiconductors; equipment for conducting, switching, transforming, accumulating, regulating or controlling electricity, namely, electricity limiters, electricity meters, electricity conduits, electricity distribution consoles, electrical switches, electrical transformers; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling the distribution or use of electricity and electric current; equipment for conducting, switching, transforming, accumulating, regulating or controlling the distribution or use of electricity

Filing History

TEAS/EMAIL CORRESPONDENCE ENTERED
May 31, 2026 TEME
CORRESPONDENCE RECEIVED IN LAW OFFICE
May 31, 2026 CRFA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
May 31, 2026 TROA
REFUSAL PROCESSED BY IB
Feb 19, 2026 RFNT
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Feb 5, 2026 RFCS
REFUSAL PROCESSED BY MPU
Feb 5, 2026 RFRR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Jan 9, 2026 RFCR
NON-FINAL ACTION WRITTEN
Jan 8, 2026 CNRT
ASSIGNED TO EXAMINER
Dec 29, 2025 DOCK
APPLICATION FILING RECEIPT MAILED
Sep 29, 2025 MAFR
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Sep 29, 2025 NWOS
LIMITATION FROM ORIGINAL APPLICATION ENTERED
Sep 29, 2025 LIMI
SN ASSIGNED FOR SECT 66A APPL FROM IB
Sep 25, 2025 REPR