EXTREME LITHOGRAPHY Trademark
Serial Number: 76310238 • Registration: 2793667
Trademark Classes
Class 9 - Computers & Electronics
Scientific, nautical, surveying, photographic, cinematographic, optical apparatus and instruments
Class 40 - Treatment & Processing
Treatment of materials
Class 42 - Computer & Scientific
Scientific and technological services; industrial analysis and research services
Owner Contact Info
Legal Representation
Trademark Details
Filing Date
September 7, 2001
Registration Date
December 16, 2003
Published for Opposition
September 23, 2003
Goods & Services
Custom manufacturing for others of structures having dimensions between 5mm and 250nm, namely, semiconductor, superconductors, molecular aggregates, polymer structures and metals
Software for electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra-high resolution replication technologies; measurement standard devices for nanometrology, namely measuring tools having a pattern in the micrometer or nanometer ranges
Services in the field of electron beam writing, namely, research, development, consulting and customized services provided for others via focused electrons relating to solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, namely, research, development and consulting services provided for others relating to structures between 5nm and 250nm; development for others and technical support services, namely, troubleshooting of computer software problems, all in the fields of electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies
