EPIREVO Trademark
Serial Number: 79154769 • Registration: 4774790
Trademark Classes
Owner Contact Info
8-1, Shinsugita-cho, Isogo-ku
Yokohama-shi, Kanagawa 235-8522 , JP
Entity Type: 03
Legal Representation
Correspondence Address
Anna King Banner & Witcoff, Ltd.
71 South Wacker Drive, 36th Floor
Chicago, IL 60606
United States
Trademark Details
Filing Date
April 2, 2014
Registration Date
July 21, 2015
Published for Opposition
May 5, 2015
Goods & Services
Repair, maintenance and installation of the following goods: apparatus for depositing on semiconductor wafers, apparatus for performing epitaxial growth on semiconductor wafers, apparatus for forming compound semiconductor films on semiconductor wafers, Metal Organic Chemical Vapor Deposition (MOCVD) apparatus, Chemical Vapor Deposition (CVD) apparatus, etching apparatus, semiconductor manufacturing apparatus and parts, accessories and pipes therefor; repair, maintenance and installation of apparatus and devices used for semiconductor manufacturing apparatus, namely, reduced pressure control apparatus, temperature control apparatus, rotation control apparatus, other control apparatus, gas supply apparatus and their parts, exhaust gas treatment apparatus and their parts, wafer carrier devices, wafer carrier robots, wafer cleaning apparatus, temperature measuring devices, wafer curvature measuring apparatus and parts, accessories and pipes for the aforesaid apparatus and devices; providing information in the fields of repair, maintenance and installation of the aforesaid apparatus and devices, their parts, accessories and pipes
Apparatus for depositing on semiconductor wafers; apparatus for performing epitaxial growth on semiconductor wafers; apparatus for forming compound semiconductor films on semiconductor wafers; Metal Organic Chemical Vapor Deposition (MOCVD) apparatus for use in research, development and production; Chemical Vapor Deposition (CVD) apparatus for use in research, development and production; dry etching machines; semiconductor manufacturing apparatus; apparatus and devices used for the aforesaid apparatus, namely, reduced pressure control apparatus, temperature control apparatus, rotation control apparatus, other control apparatus, gas supply apparatus, exhaust gas treatment apparatus, wafer carrier devices, wafer carrier robots, wafer cleaning apparatus, temperature measuring devices, wafer curvature measuring apparatus; parts, accessories and pipes for the aforesaid goods
