CMP-TEMP Trademark

Apparatus and instruments for physics, namely, measuring devices for monitoring and measuring environmental conditions inside semiconductor processing chambers, including Chemical Mechanical Planarization (CMP) systems; Diagnostic equipment for research laboratory use, namely, pressure and temperature sensing wafers for measuring temperature, pressure, thermal profile, and chamber environmental conditions during semiconductor wafer processing; Measures for measuring pressure and temperature distribution, thermal profiles, and environmental characteristics within semiconductor process chambers; Computer software, recorded, for collecting, analyzing, and displaying pressure and temperature measurement data obtained during semiconductor processing; Computer software applications, downloadable, for collecting, analyzing, and displaying pressure and temperature measurement data obtained during semiconductor processing