CANON Trademark

machines and apparatus for sputtering; machines and apparatus for sputter deposition; sputtering systems comprised of load lock chambers, substrate transferring machines, substrate processing machines for manufacturing semiconductors and control machines used for semiconductor manufacturing machines; physical vapor deposition equipment in the nature of machines for thin-film coatings; semiconductor manufacturing machines; semiconductor manufacturing equipment, namely, physical vapor deposition (PVD) machines for thin-film coatings, atomic diffusion bonding (ADB) machines, ion beam etching (IBE) machines, reactive ion etching (RIE) machines, and wafer metrology machines; bonding equipment for semiconductor manufacturing, namely, machines for bonding semiconductor substrates using atomic diffusion; atomic diffusion bonding equipment, namely, atomic diffusion bonding machines for bonding semiconductor substrate to semiconductor substrate; vacuum pumps and their parts; valves as machine components; magnetic sensor manufacturing equipment, namely, physical vapor deposition (PVD) machines for thin-film coatings, atomic diffusion bonding (ADB) machines, ion beam etching (IBE) machines and reactive ion etching (RIE) machines; vacuum chambers and their parts; rotary printing presses and their parts; flat panel display (FPD) lithography equipment, namely, lithography machines for use in manufacturing flat panel displays and parts therefor; semiconductor lithography equipment, namely, steppers, scanners, nano imprint lithography machines, and wafer metrology machines and parts therefor; laser material processing equipment, namely, LED optical encoders, laser diode optical encoders, digital position sensors, and digital servo controllers; digital galvanometer scanners and structural parts therefore; laser drilling machines and equipment