C.CRYSCOO Trademark

Hardware and downloadable software for operation of semiconductor manufacturing machines and heating installations

Machines for processing semiconductors, solar cells, fibers and other substrates; machines for etching semiconductor surfaces; machines for vaporizing or coating semiconductor surfaces, under vacuum CVD method or atmospherically or under the influence of plasma; machines for conveying goods via atmospheric, subatmospheric, or under a predefined gas atmosphere process, namely, cyclone separators; machines for applying plasma-based coatings; atomic layer deposition machines; mechanical installations and devices for thermal treatment or manufacturing processes, namely, coating installations, annealing installations, installations for vacuum soldering, installations for chemical vapor deposition (CVD installations); machines for thermal layer growth and thermal layer transformations, namely, electrostatic coating machines

Building construction; repair, installation and maintenance of machines and machine tools and individual parts therefor, all for the manufacture and processing of solar cells being turnkey solutions, semiconductors, fibers and raw materials therefor; assembly services relating to installation of semiconductor devices, atmospheric as well as sub-atmospheric

Baking ovens; vacuum furnaces; laminating ovens; machines for thermal, dry and wet-chemical exhaust gas and gas cleaning, namely, thermal cleaning ovens; machines for the thermal processing of semiconductors, solar cells, fibers and other substrates and their thermal processing under vacuum, namely, industrial furnaces; annealing installations consisting of furnaces being parts of machines for the thermal treatment of surfaces and objects; diffusion furnaces, continuous furnaces, coating furnaces being parts of machines for the thermal treatment of surfaces and objects; installations for treating and cleaning gases and exhaust gases, namely, exhaust gas cleaning installations in the nature of ionization apparatus for the treatment of exhaust gases for industrial use; diffusion furnaces, continuous furnaces, baking furnaces being parts of systems and devices for thermal treatment or manufacturing processes; radiation- based rapid heating systems consisting of heating apparatus; furnaces for thermal film growth and thermal film transformations