BARRACUDA
DEAD

Serial Number

76075632

Owner

STEAG MICROTECH GMBH

Attorney

Robert W. Becker

Filing Date

Jun 20, 2000

Add to watchlist:

No watchlists yet
View on USPTO

BARRACUDA Trademark

Serial Number: 76075632 • Registration: 2648048

BARRACUDA is a trademark filed by STEAG MICROTECH GMBH on June 20, 2000. The trademark is classified under Class 7 (Machinery), Class 37 (Building & Construction). The application is currently no longer active.

Owner Contact Info

STEAG MICROTECH GMBH (9 trademarks)

DONAUESCHINGEN
DONAUESCHINGEN , DE

Entity Type: 99

Trademark Details

Filing Date

June 20, 2000

Registration Date

November 12, 2002

Published for Opposition

August 20, 2002

Cancellation Date

June 20, 2009

Goods & Services

Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces

Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces

Filing History

CANCELLED SEC. 8 (6-YR)
Jun 20, 2009 C8..
CASE FILE IN TICRS
Jan 8, 2008 CFIT
ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY
Jan 2, 2008 ASCK
TEAS CHANGE OF CORRESPONDENCE RECEIVED
Nov 17, 2002 TCCA
REGISTERED-PRINCIPAL REGISTER
Nov 12, 2002 R.PR
PUBLISHED FOR OPPOSITION
Aug 20, 2002 PUBO
NOTICE OF PUBLICATION
Jul 31, 2002 NPUB
APPROVED FOR PUB - PRINCIPAL REGISTER
Mar 18, 2002 CNSA
EXAMINERS AMENDMENT MAILED
Mar 14, 2002 CNEA
EXAMINERS AMENDMENT MAILED
Mar 6, 2002 CNEA
CORRESPONDENCE RECEIVED IN LAW OFFICE
Dec 18, 2001 CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
Dec 14, 2001 CRFA
NON-FINAL ACTION MAILED
Jun 14, 2001 CNRT
ASSIGNED TO EXAMINER
Jun 12, 2001 DOCK
SEC. 44(D) CLAIM DELETED
Aug 29, 2000 44DD
PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED
Aug 29, 2000 AMPX