ADCON Trademark
Serial Number: 76560689 • Registration: 3371139
Trademark Classes
Owner Contact Info
Trademark Details
Filing Date
November 18, 2003
Registration Date
January 22, 2008
First Use Anywhere
January 1, 1997
First Use in Commerce
January 1, 1997
Published for Opposition
November 6, 2007
Goods & Services
Chemical mechanical planarization (CMP) and cleaning related products used in semiconductor manufacturing to enable lower manufacturing costs and higher productivity and yield, namely, advanced abrasive compositions in both suspension and solid form in controlled shapes and particle size distributions, namely, cerium oxide, manganese oxide, silicon oxide, aluminum oxide, zirconium oxide and combinations or reaction products thereof