Shenzhen Huayu Future Technology Co., Ltd – Trademark Portfolio

Entity Type: 16

Shenzhen Huayu Future Technology Co., Ltd holds 1 U.S. trademark filed with the United States Patent and Trademark Office (USPTO), with a strong focus on Class 10 (Medical Apparatus) — 1 filings in this category. Currently, 1 trademark is registered. Notable registered marks include AEVURA. The owner is based in Longgang, Shenzhen.

701L3 Dongjia INTL, Dongshen COML

No. 19 Longgang Rd, Pingnan comm.

Longgang, Shenzhen 518000 , CN

1 Total Trademarks

Add to watchlist:

No watchlists yet
Loading...
By Date
By Name
Filter by Class:

AEVURA
AEVURA
Registered 2025

Trademark Classifications

Shenzhen Huayu Future Technology Co., Ltd's trademark portfolio spans 1 Nice Classification class, reflecting the scope of goods and services protected under their brand portfolio.

10
Medical Apparatus (1 filing)

Surgical, medical, dental and veterinary apparatus and instruments

Frequently Asked Questions

How many trademarks does Shenzhen Huayu Future Technology Co., Ltd have?

Shenzhen Huayu Future Technology Co., Ltd has 1 U.S. trademark filed with the USPTO. Of these, 1 registered.

What trademark classes does Shenzhen Huayu Future Technology Co., Ltd file in?

Shenzhen Huayu Future Technology Co., Ltd files trademarks across 1 Nice Classification class. The most active classes are Class 10 (Medical Apparatus). Class 10 covers surgical, medical, dental and veterinary apparatus and instruments.

What are Shenzhen Huayu Future Technology Co., Ltd's most well-known trademarks?

Shenzhen Huayu Future Technology Co., Ltd's registered trademark portfolio includes well-known marks such as AEVURA. These are among 1 currently registered trademark in the portfolio.

What is Shenzhen Huayu Future Technology Co., Ltd's trademark registration success rate?

Shenzhen Huayu Future Technology Co., Ltd has a 100% trademark registration rate, with 1 out of 1 resolved applications resulting in successful registration. Currently, 0 applications are pending review.