Fluid Environmental Services, Inc. – Trademark Portfolio
Entity Type: 03
Fluid Environmental Services, Inc. holds 2 U.S. trademarks filed with the United States Patent and Trademark Office (USPTO), with a strong focus on Class 37 (Building & Construction) — 1 filings in this category. The portfolio also extends into Class 1 (Chemicals) across 3 Nice Classification classes. Currently, 1 trademark is registered. Notable registered marks include RUST RELEASE. The owner is based in Chicago, IL.
6637 North Talman Avenue
Chicago, IL 60645
Showing of trademarks Trademarks
Trademark Classifications
Fluid Environmental Services, Inc.'s trademark portfolio spans 3 Nice Classification classes, reflecting the scope of goods and services protected under their brand portfolio.
Chemical products for industry, science, photography, agriculture, horticulture and forestry
Bleaching preparations and other substances for laundry use; cleaning, polishing, scouring
Frequently Asked Questions
How many trademarks does Fluid Environmental Services, Inc. have?
Fluid Environmental Services, Inc. has 2 U.S. trademarks filed with the USPTO. Of these, 1 registered, 1 cancelled.
What trademark classes does Fluid Environmental Services, Inc. file in?
Fluid Environmental Services, Inc. files trademarks across 3 Nice Classification classes. The most active classes are Class 37 (Building & Construction), Class 1 (Chemicals), Class 3 (Cosmetics & Cleaning). Class 37 covers building construction; repair; installation services.
What are Fluid Environmental Services, Inc.'s most well-known trademarks?
Fluid Environmental Services, Inc.'s registered trademark portfolio includes well-known marks such as RUST RELEASE. These are among 1 currently registered trademark in the portfolio.
What is Fluid Environmental Services, Inc.'s trademark registration success rate?
Fluid Environmental Services, Inc. has a 50% trademark registration rate, with 1 out of 2 resolved applications resulting in successful registration. Currently, 0 applications are pending review.